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Custom thermal stage for X-Ray analysis inside vacuum chamber
-100°C to 450°C
Mounts to open port of SAXS vacuum chamber
Accomodates 25mm diameter silicon wafer samples
3mm diameter transmission aperture
INS1909324
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DESCRIPTION
INS1909324 was designed to enable temperature control during X-Ray analysis of silicon wafers. The stage has a wide temperature range of -100°C to 450°C, made possible by LN2 cooling chanels embedded in the sample area. An adjustable sample clip is used to secure up to 25mm diameter silicon wafer samples, ensuring good thermal contact in either horizontal or vertical mounting orientations. The stage was designed to mount to the open port of a SAXS vacuum chamber, but can be adapted to fit almost any vacuum feedthrough. Water cooling ports enable frame cooling, which keeps the stage frame close to room temperature even when operating at 450°C.